Predicate |
Object |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2333-02 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61L15-60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61L15-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F120-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F6-008 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F6-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61L15-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J20-267 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J3-245 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J3-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J3-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F6-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J3-24 |
filingDate |
2013-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2019-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2019-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-102000808-B1 |
titleOfInvention |
Polyacrylic acid (salt) water-absorbing resin and manufacturing method therefor |
abstract |
Provided is a method for producing an absorbent resin having acrylic acid as a raw material suitable for mass production of an absorbent resin and having excellent absorbing performance. A method for producing a polyacrylic acid (salt) water absorbent resin comprising a predetermined monomer production step, a polymerization step, a drying step and a surface cross-linking step in sequence, wherein the concentration of acetic acid in acrylic acid or the like supplied to the monomer production step is 300 To 10000 ppm, and the rate of decrease in acetic acid concentration defined by a predetermined formula is 35% or more. |
priorityDate |
2012-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |