http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101999418-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-4854 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-4825 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-4238 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-7671 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L75-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L75-04 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L75-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J9-28 |
| filingDate | 2013-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101999418-B1 |
| titleOfInvention | Polishing pad and method for producing polishing pad |
| abstract | A step of dissolving a composition for forming a polyurethane resin film containing a polyurethane resin and an additive in a soluble solvent of the resin so that an insoluble component in the solution is less than 1% by mass based on the total mass of the composition for forming a polyurethane resin film; A method for producing a polyurethane resin, comprising the steps of: removing an insoluble component; adding a poor solvent to 1 g of the solid mass of the resin to the solution from which the insoluble component has been removed; And a step of forming the polyurethane resin film on the film base material by the wet coagulation method to form a polyurethane resin film on the film base material, By the method of manufacturing a polishing pad having a polishing layer, it is possible to perform polishing with less polishing scratches and to form a stable film It provides a manufacturing method and a polishing pad of a polishing pad for a bunch. |
| priorityDate | 2012-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.