Predicate |
Object |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67772 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02211 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0217 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67772 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67739 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67766 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67775 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45546 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67196 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67242 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4408 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45591 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67313 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45578 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45589 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4584 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-345 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-677 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
filingDate |
2016-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2019-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2019-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-101998578-B1 |
titleOfInvention |
Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium |
abstract |
The present invention shortens the time for reducing the oxygen concentration in the transport chamber. A transfer chamber for transferring the substrate from a storage container for containing the substrate; A purge gas supply mechanism for supplying a purge gas into the transport chamber; And a pressure control mechanism provided in the exhaust passage for exhausting the atmosphere in the transport chamber and controlling the pressure in the transport chamber, wherein the pressure control mechanism includes an exhaust damper for opening or closing the exhaust passage; And an adjustment damper provided in the exhaust damper and configured to hold the inside of the transport chamber at a predetermined pressure. |
priorityDate |
2015-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |