http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101993322-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-60 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2012-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101993322-B1 |
| titleOfInvention | Glass substrate for mask blank, substrate with multilayer reflective film, mask blank and mask, and preparation method for the same |
| abstract | An object of the present invention is to provide a glass substrate for a mask blank capable of forming a reference mark capable of improving the precision of detection of a defect position and the like and further capable of reproducing (reusing) the glass substrate, The base layer 21 for reducing the surface roughness of the substrate 11 or reducing the surface defects of the substrate 11 is formed on the main surface of the glass substrate 11 for mask blank where the transfer pattern is formed The surface of the base layer 21 is a precision polished surface. A reference mark 22 serving as a reference of a defect position in defect information is formed on the base layer 21. |
| priorityDate | 2011-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 24.