| abstract |
A resist composition containing a compound represented by the general formula (1) or (2), a resist pattern forming method using the resist composition, a polyphenol compound used therefor, and an alcohol compound derived therefrom. (Formula (1) and (2) of, R 1 are each a single bond independently or 2n valent hydrocarbon group having 1 to 30 carbon atoms group, the hydrocarbon group is a cyclic hydrocarbon group, a double bond, a heteroatom or a carbon number of 6 to And R 2 each independently represent a hydrogen atom, a halogen atom, a straight chain, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an aryl group having 2 to 10 carbon atoms An alkenyl group or a hydroxyl group and may be the same or different in the same naphthalene ring, at least one of R 2 is a hydroxyl group, n is an integer of 1 to 4, and the repeating units of the formulas (1) and (2) (1), m 1 is independently an integer of 1 to 7, and in the general formula (2), X is each independently an oxygen atom or a sulfur atom, and the structural formula thereof may be the same or different. , m < 2 > are each independently an integer of 1 to 6.) |