http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101985883-B1

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02109
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
filingDate 2016-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2019-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2019-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101985883-B1
titleOfInvention Container for chemical precursors in a deposition process
abstract Described herein are systems and methods for using the same for the storage and delivery of chemical precursors used in the fabrication of semiconductor devices. In one aspect, the storage system comprises a chemical precursor and a vessel, and the system has an inlet injection design. The chemical precursor has a low vapor pressure of less than about 50 Torr-absolute at the vessel temperature set for delivery. The delivery system additionally contains a carrier gas. The inlet injection design can deliver the carrier gas at a specific pressure and at a particular low rate to impinge on the surface of the chemical precursor to form a vapor or dot of the chemical precursor. Thereafter, the vapor or droplets of the chemical precursor travel to the processing tool and combine with the carrier gas to provide a fluid stream full of precursors used in the processing tool.
priorityDate 2015-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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