http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101966674-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-0073 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02052 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D17-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0094 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-43 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-43 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D11-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate | 2016-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101966674-B1 |
| titleOfInvention | Process liquid, substrate cleaning method, and semiconductor device manufacturing method |
| abstract | An object of the present invention is to provide a processing solution for a semiconductor device which is excellent in the ability to remove residues and has excellent corrosion prevention performance against a cleaning object and which is capable of suppressing adhesion of foreign matter to a cleaning object, A method of cleaning a substrate used, and a method of manufacturing a semiconductor device. The treatment liquid of the present invention comprises at least one hydroxylamine compound selected from a hydroxylamine and a hydroxylamine salt, a nitrogen-containing compound having a specific structure, at least one solvent selected from an organic solvent and water Wherein the treatment liquid for semiconductor devices comprises: Among the above-mentioned treatment liquids, the number of the coefficient bodies of 0.05 탆 or more in size counted by the light scattering type in-liquid particle counter is 1 to 2,000 per 1 mL. |
| priorityDate | 2016-01-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 488.