| abstract |
Wherein an organic treatment liquid for patterning a resist film has a concentration of metal elements of Na, K, Ca, Fe, Cu, Mg, Mn, Li, Al, Cr, Ni, In particular, in a negative pattern formation method for forming a fine pattern (for example, a 30 nm node or less) pattern using an organic developing solution, an organic processing solution for patterning of a resist film capable of reducing the generation of particles, A method for producing a treatment liquid, a container for holding an organic processing solution for patterning a resist film, a pattern forming method using these, and a manufacturing method of an electronic device. |