http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101966133-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67259 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-687 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-682 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-687 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
| filingDate | 2017-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101966133-B1 |
| titleOfInvention | Precision alignment system and alignment method of substrate and mask |
| abstract | Disclosed is a precise alignment system of a substrate and a mask. The precise alignment system of the substrate and the mask according to the present invention comprises a stage unit provided with a clamping module for clamping the substrate. A stage position adjusting unit connected to the stage unit to move the stage unit relative to the mask, a load sensing unit provided in the clamping module and sensing a load of the substrate applied to the clamping module, and electrically connected to the load sensing unit. And a control unit that calculates the maximum deflection point of the substrate based on the information about the load of the substrate received from the sensing unit and controls the positioning unit based on the calculated maximum deflection point of the substrate. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102309494-B1 |
| priorityDate | 2017-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 21.