http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101961253-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B65B1-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J31-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J31-16 |
| filingDate | 2014-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101961253-B1 |
| titleOfInvention | Catalyst and formulations comprising same for alkoxysilanes hydrolysis reaction in semiconductor process |
| abstract | The present invention is a stable formulation comprising a catalyst compound comprising a silicon containing precursor selected from alkoxysilane, aryloxysilane, or alkylalkoxysilane and a haloalkoxyalkylsilane or haloaryloxyalkylsilane, wherein the silicon-containing precursor and the catalyst The substituents in the compounds have introduced the same stable formulation. More particularly, the formulation is Si (OR 1) n R 2 4-n silicon containing alkoxyalkyl silanes or aryloxy silane having the formula - the formula of containing precursor with XSi (OR 1) n R 2 3-n Lt; RTI ID = 0.0 > haloalkoxyalkylsilanes < / RTI > Or R 2 3 -p (R 1 O ) p Si-R 3 -Si (OR 1) p R 2 3-p having the formula an alkoxy or aryloxy silane silicon-containing silane-containing precursor and a (R 1 O ) m R 2 2 -m (X ) Si-R 3 -Si (oR 4) 2 in R 5 includes a haloalkoxy, alkylsilane or halo aryloxyalkyl catalyst comprising silranreul having the formula, where, R 1 and R a second one or more of the substituents or all of the silicon-containing precursor and is the same for both catalyst compound. The formulations can be used in semiconductor deposition processes, such as flow silicon oxide processes. |
| priorityDate | 2012-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 123.