http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101957746-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate | 2012-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101957746-B1 |
| titleOfInvention | Photo-patternable and developable silsesquioxane resins for use in device fabrication |
| abstract | When applied to the surface of a substrate, a coatable resin solution is provided that is photo-patternable upon exposure to ultraviolet radiation and is capable of forming a developable coating as a dielectric material. The resin solution includes a silsesquioxane-based (SSQ-based) resin, at least one initiator, and an organic solvent. The SSQ resin comprises both a hybrid component and at least one photo-curable component. The resulting coating exhibits a dielectric constant of about 3.5 or less. |
| priorityDate | 2011-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 56.