http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101940162-B1

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05G2-00
filingDate 2012-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2019-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2019-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101940162-B1
titleOfInvention Systems and methods for buffer gas flow stabilization in a laser produced plasma light source
abstract An extreme ultraviolet (EUV) light source is disclosed that includes an optical member, a target material, and a laser beam that passes through the optical member along a beam path to irradiate the target material. The EUV light source further includes a system for generating a gas flow directed toward the target material along the beam path, the system comprising a tapering member surrounding the volume and a plurality of gas lines, The gas line outputs the gas stream in this volume.
priorityDate 2011-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 26.