http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101936566-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D129-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D125-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D165-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 |
| filingDate | 2013-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101936566-B1 |
| titleOfInvention | Composition for forming overlay film, and resist pattern formation method using same |
| abstract | [PROBLEMS] To provide a composition for forming an upper layer film capable of forming a pattern having excellent roughness and pattern shape in a pattern formation method by extreme ultraviolet exposure, and a pattern forming method using the same. [MEANS FOR SOLVING PROBLEMS] A composition for forming an upper layer film comprising a fullerene derivative having a hydrophilic group and a solvent, and a method for forming the pattern by applying the composition onto a resist surface and exposing and developing the composition. The composition may also comprise a polymer. |
| priorityDate | 2012-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 40.