http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101930210-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31133 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-01016 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6708 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02052 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02557 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6715 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-423 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02096 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate | 2018-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2018-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2018-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101930210-B1 |
| titleOfInvention | Substrate treatment device and substrate treatment method |
| abstract | An object of the present invention is to provide a substrate processing apparatus and a substrate processing method capable of improving the processing performance and reducing the amount of the processing liquid used. The substrate processing apparatus 1 according to the embodiment includes a first liquid supply portion 3a for supplying a sulfuric acid solution having a first temperature equal to or higher than the boiling point of hydrogen peroxide water to the substrate W, A second liquid supply portion 3b for supplying a mixed liquid of a second temperature lower than the temperature of the substrate W to the processing target surface Wa of the substrate W, (3a) supplies the sulfuric acid solution at the first temperature, and when the temperature of the substrate (W) reaches the second temperature or more, the first liquid supply section (3a) stops the supply of the sulfuric acid solution at the first temperature , And a control unit (5) for causing the second liquid supply unit (3b) to supply the mixed liquid of the second temperature. |
| priorityDate | 2014-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 34.