http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101926694-B1

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-20
filingDate 2012-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2018-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2018-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101926694-B1
titleOfInvention Silicon carbide epi wafer and method of fabricating the same
abstract A method of manufacturing an epitaxial wafer according to an embodiment includes: preparing a wafer in a susceptor; Surface treating the wafer; And growing an epitaxial layer on the wafer. An epitaxial wafer according to an embodiment includes: a wafer; And an epitaxial layer formed on the wafer, wherein the surface defect of the wafer is 0.5 ea / cm &lt; 2 &gt;.
priorityDate 2012-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 32.