| abstract |
The present invention relates to a laminated film comprising a substrate and at least one thin film layer formed on at least one surface of the substrate, wherein at least one of the thin film layers contains silicon, oxygen and hydrogen, and the 29 Si solid NMR The ratio of the sum of the peak areas of Q 1 , Q 2 and Q 3 to the peak area of Q 4 based on the abundance ratio of the silicon atoms having different binding states with the oxygen atoms obtained from the measurement satisfies the following condition (I) The present invention relates to a laminated film satisfying the above-mentioned requirements. (Sum of peak areas of Q 1 , Q 2 and Q 3 ) / (peak area of Q 4 ) < 1.0 ... (I) (Q 1 is a silicon atom bonded to one neutral oxygen atom and three hydroxyl groups, Q 2 is a silicon atom bonded to two neutral oxygen atoms and two hydroxyl groups, Q 3 is silicon bonded to three neutral oxygen atoms and one hydroxyl group, Atom, Q 4 : a silicon atom bonded to four neutral oxygen atoms) |