| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G69-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D177-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G69-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G69-48 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C233-87
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C233-81
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate |
2014-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2018-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2018-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101906788-B1 |
| titleOfInvention |
Composition for forming resist underlayer film |
| abstract |
[PROBLEMS] To provide a dendrimer compound capable of improving marginal dimensional uniformity and depth of focus margin, and a composition capable of forming a lower layer film. [MEANS FOR SOLVING PROBLEMS] A dendrimer compound containing an amide bond or a branched chain containing an ester bond and an aromatic skeleton, and a composition for forming a lower layer film containing the dendrimer compound. |
| priorityDate |
2013-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |