http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101901963-B1

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filingDate 2018-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2018-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d1df9ded2392f4c2adac3b5a7973c48
publicationDate 2018-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101901963-B1
titleOfInvention Gas cabinet for semiconductor manufacturing apparatus
abstract According to an aspect of the present invention, A storage container installed in the housing and storing the source gas; A heating means installed on the surface of the storage container and including a heat pipe filled with a heat generating fluid therein and a heater for supplying heat energy to the heat pipe and heating the heat generating fluid to heat the storage container; A gas discharge means including a pipe for supplying a carrier gas into the interior of the storage container and discharging the source gas to the outside together with the carrier gas; And a gas leakage detection means provided at a connection portion between the pipe and the pipe of the gas discharge means for visually and electrically detecting whether or not the gas leaks from the connection portion of the pipe.
priorityDate 2018-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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