http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101901429-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-0143 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-3452 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-107 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24802 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-064 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-1545 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0082 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2012 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2035 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate | 2011-11-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2018-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2018-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101901429-B1 |
| titleOfInvention | Photoimaging |
| abstract | The present invention relates to a photoimaging method and apparatus. More particularly, the present invention relates to a method and apparatus for (e. G., Directly) photo-imaging a substrate, such as a web, covered with a liquid curable photopolymer, wherein a rotatable phototool is pressed against the substrate A method of photo imaging that generates an imaged substrate that is rotated and used to form images suitable for forming electrical circuits such as printed circuit boards (PCBs), flat panel displays, and flexible circuits; and ≪ / RTI > The present invention also relates to a curable, A method and apparatus for direct photo-imaging of a substrate coated with a photopolymer, wherein the photoimaged substrate is used to form images, such as electrical circuits, and the present invention also includes at least a portion of the solder mask on the printed circuit board, A hardenable process where the imaging process takes place in the area above the solder mask? And a method and an apparatus for exposure using a photopolymer. |
| priorityDate | 2010-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.