abstract |
An object of the present invention is to provide a photolithography method using a high energy beam such as ArF excimer laser beam, EB, EUV, etc., as a light source, An object of the present invention is to provide a monomer and the like which are used in a chemically amplified resist composition which is excellent in balance and is excellent in compatibility and in which defects are hardly expressed. [MEANS FOR SOLVING PROBLEMS] A monomer represented by the following formula (1). |