| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D213-643
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-423
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D413-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-422 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate |
2011-11-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2018-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2018-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101880303-B1 |
| titleOfInvention |
Photoresist stripper composition |
| abstract |
The present invention relates to a resist stripping liquid composition which is excellent in resist residue removal ability by dry / wet etching during pattern formation in the process of manufacturing a flat panel display substrate. |
| priorityDate |
2011-11-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |