http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101869929-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D161-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L61-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-04 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L61-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2012-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2018-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2018-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101869929-B1 |
| titleOfInvention | Phenolic resin and material for forming underlayer film for lithography |
| abstract | The present invention provides a novel phenolic resin which can be used as a coating agent for semiconductors or a resist resin and has a high carbon concentration in the resin, a low oxygen concentration, a relatively high heat resistance, and a relatively high solvent solubility. In addition, a material useful for forming a new photoresist underlayer film having a high solubility in solvents and applicable to a wet process and having excellent etching performance as a multilayer resist underlayer film, a lower layer formed using the same, and a pattern forming method using the same . The resin of the present invention is obtained by reacting a compound having a specific structure and an aldehyde having a specific structure in the presence of an acidic catalyst. The lower layer film forming material for lithography of the present invention includes at least the resin and an organic solvent. |
| priorityDate | 2011-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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