http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101869598-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2016-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2018-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2018-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101869598-B1 |
| titleOfInvention | Manufacturing method of multi-gray scale photomask, multi-gray scale photomask and method of manufacturing display device |
| abstract | A transfer pattern having a boundary between a transparent portion and a light-shielding portion and a boundary between a translucent portion and a light-shielding portion is formed with high precision without causing pattern deterioration due to wet etching and alignment shift, thereby manufacturing a multi- ≪ / RTI > A method of manufacturing a multi-gradation photomask having a transfer pattern including a light-shielding portion, a translucent portion, and a translucent portion formed by patterning a light-shielding film and a semitransparent film formed on a transparent substrate, the transfer pattern comprising: And a step of forming the translucent portion and the transparent portion adjacent to each other and having a predetermined step. |
| priorityDate | 2014-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 16.