http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101861403-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0276 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-266 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-04 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
| filingDate | 2014-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2018-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2018-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101861403-B1 |
| titleOfInvention | Underlayer film composition and patterning process |
| abstract | The present invention relates to a lower layer film material containing a novolak resin having a repeating unit represented by the formula (1) as a photoresist lower layer film material used in lithography. Wherein R 1 is a hydrogen atom, an acid labile group, a glycidyl group, or an alkyl group, an acyl group, an alkoxycarbonyl group, R 2 is a hydrogen atom, an alkyl group, an alkenyl group or an aryl group, R 3 is a hydrogen atom, an alkyl group, X is a methylene group, an ethylene group, an ethynylene group, -S- or -NH-, m and n are 1 or 2, The novolac resin having a repeating unit of hydroxy coumarin in the resist underlayer film material of the present invention is hydrolyzed by alkaline water to be hydroxycinnamic acid, so that a carboxyl group is generated and becomes soluble in an aqueous alkaline solution. This makes it possible to peel off the Si substrate or the SiO 2 substrate implanted with ions without damaging them. |
| priorityDate | 2013-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 437.