http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101861372-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D18-0054 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D3-14 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D18-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate | 2011-11-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2018-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2018-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101861372-B1 |
| titleOfInvention | Method of forming silicate polishing pad |
| abstract | The method provides a method of making a silicate-containing polishing pad useful for polishing at least one of a semiconductor substrate, a magnetic substrate, and an optical substrate. The method includes introducing a feed stream of gas filled polymeric microelements into a gas jet. The polymeric microelements have various densities, various wall thicknesses and various particle sizes. The gas-filled microelements in the gas jet pass close to the Coanda block and the Coanda block has a curved wall that separates the polymeric microelements by the Coanda effect, inertia and gas induced resistance. The assembling polymer microelements are separated from the curved walls of the Coanda block to purify the polymer microelements. The recovered polymeric microelements comprising i) silicate particles having a particle size of greater than 5 [mu] m; ii) silicate containing regions covering more than 50% of the outer surface of the polymeric microelements; And iii) less than 0.1% by weight of the total polymeric microelements associated with the polymeric microelements that aggregate with the silicate particles at an average cluster size of greater than 120 [mu] m. The purified polymeric microelements are inserted into the polymer matrix to form a polishing pad. |
| priorityDate | 2010-11-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 54.