abstract |
[PROBLEMS] To provide a resist undercoat film having heat resistance for use in a lithography process of semiconductor device fabrication, and a high-refractive-index film having transparency for use in an electronic device. [MEANS FOR SOLVING PROBLEMS] The following formula (1) In the formula (1), R 1 , R 2 , R 3 and R 5 each represent a hydrogen atom, and R 4 represents a phenyl group or a naphthyl group. A resist underlayer film forming composition containing the polymer, and a resist underlayer film formed from the composition. A high-refractive-index film-forming composition comprising the polymer and a high-refractive-index film formed therefrom. |