http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101855528-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 2012-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2018-05-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2018-05-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101855528-B1 |
| titleOfInvention | Resist composition and method for producing resist pattern |
| abstract | An object of the present invention is to provide a resist composition which can obtain a resist pattern having an excellent mask error factor and little occurrence of defects. (A1) a resin having a structural unit represented by the formula (I), (A2) a resin insoluble or hardly soluble in an aqueous alkali solution and capable of being dissolved in an alkali aqueous solution by the action of an acid, (B) an acid generator, and ) A resist composition comprising a compound represented by the formula (II). [In the formula (I), R 1 represents a hydrogen atom or a methyl group; A 1 represents an alkanediyl group having 1 to 6 carbon atoms; R 2 represents a hydrocarbon group having 1 to 10 carbon atoms and having a fluorine atom; Ring W 1 represents a saturated heterocycle having 2 to 36 carbon atoms; R 3 represents a hydrocarbon group having 1 to 30 carbon atoms, and one or more -CH 2 - included in the hydrocarbon group is substituted with -O- or -CO-] |
| priorityDate | 2011-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 187.