http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101852807-B1

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filingDate 2011-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2018-05-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2018-05-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101852807-B1
titleOfInvention Cleaning agent for semiconductor substrate, method of cleaning using the same, and method of manufacturing semiconductor device
abstract (Problem) It is an object of the present invention to provide a semiconductor device which can exert a cleaning power equivalent to that of an SPM cleaning agent and significantly improve the damage of the semiconductor substrate by the SPM cleaning agent and effectively remove and remove impurities adhered to the surface of the semiconductor substrate, A cleaning agent for a semiconductor substrate, a cleaning method using the cleaning agent, and a method of manufacturing a semiconductor element are provided. A cleaning method for semiconductor substrates characterized by using sulfuric acid, hydrogen peroxide, and alkylene carbonate, and cleaning the semiconductor substrate with a combination of sulfuric acid, hydrogen peroxide, and alkylene carbonate.
priorityDate 2010-09-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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