http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101845712-B1

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f6b149ea1849da2de91fd17cd1a239c5
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-56
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filingDate 2016-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2018-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_323faeb814b62b29c2b69a822962aff3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_464c29442d012577125dc590e60f7218
publicationDate 2018-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101845712-B1
titleOfInvention Thin layers deposition apparatus
abstract A thin film deposition apparatus is disclosed. A thin film deposition apparatus according to the present invention includes: a source unit disposed inside a vacuum chamber in which a deposition process is performed on a substrate and discharging a deposition material to be deposited on the substrate; a substrate unit connected to the vacuum chamber, A substrate alignment unit connected to the vacuum chamber for selectively shielding and opening the substrate with respect to the source unit and transferring the thermal energy emitted from the source unit to the substrate alignment unit; And a shutter unit provided with a heat-shielding shutter module which is provided so as to be able to be cooled so as to shut off the shutter unit.
priorityDate 2016-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID426153049

Total number of triples: 26.