http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101844070-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 2011-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2018-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2018-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101844070-B1 |
| titleOfInvention | Resist composition and method for producing resist pattern |
| abstract | The resist composition comprises a resin having a structural unit represented by the formula (aa) and a structural unit represented by the formula (ab); And acid generators. (Wherein R aa1 represents a hydrogen atom and a methyl group, A aa1 represents an optionally substituted C 1 to C 6 alkanediyl group, and R aa2 represents a C 1 to C 18 aliphatic hydrocarbon group which may be substituted. alicyclic in which W 1 is optionally substituted C 4 to C 36; represents; R ab1 is a hydrogen atom and a methyl group; a ab1 is a single bond, represents alkanediyl group such as optionally substituted C 1 to C 6 N is 1 or 2, A ab2 represents a C 1 to C 6 aliphatic hydrocarbon group which may in each case independently be substituted, and R ab2 represents in each case independently a C 1 to C 12 fluorinated alkyl group, ) |
| priorityDate | 2010-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 239.