| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate |
2011-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2018-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2018-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101841507-B1 |
| titleOfInvention |
Pattern forming method and actinic-ray- or radiation-sensitive resin composition |
| abstract |
An object of the present invention is to provide a pattern forming method and an actinic ray-sensitive or radiation-sensitive resin composition excellent in marginal resolution, roughness characteristics, exposure latitude (EL) and bridge defect characteristics. The pattern forming method includes the steps of (1) forming a sensitizing actinic ray or radiation-sensitive resin composition into a film, (2) exposing the film, and (3) exposing the exposed film with a developer containing an organic solvent Process. The above actinic ray-sensitive or radiation-sensitive resin composition contains (A) a resin containing a repeating unit having a structural part decomposed upon exposure to an actinic ray or radiation to generate an acid, and (B) a solvent. |
| priorityDate |
2010-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |