| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
| filingDate |
2011-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2018-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2018-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101841454-B1 |
| titleOfInvention |
Compositions comprising base-reactive component and processes for photolithography |
| abstract |
New photoresist compositions having base-reactive groups and particularly suitable for dry lithography are provided. Particularly preferred photoresists of the present invention may exhibit reduced defects after development of the resist coating layer. |
| priorityDate |
2010-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |