http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101829747-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-56 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-033 |
| filingDate | 2015-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2018-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2018-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101829747-B1 |
| titleOfInvention | Method of producimg hardmask layer, and method of forming patterns |
| abstract | And a method of manufacturing the hard mask layer. According to one embodiment, there is provided a method of manufacturing a semiconductor device, comprising: coating a first composition comprising an organic compound on a patterned substrate and then curing to form a first hardmask layer; and forming a second hardmask layer on the first hardmask layer, Coating the composition and then curing to form a second hard mask layer. |
| priorityDate | 2015-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 160.