| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2103-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-68 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6704
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02068
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02052
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23G1-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J31-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23G1-103
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F9-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23G1-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23G1-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J31-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-68 |
| filingDate |
2014-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2018-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2018-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101824785-B1 |
| titleOfInvention |
Cleaning method for exposed copper substrate and cleaning system |
| abstract |
The water outlet of the subsystem having the ultraviolet oxidation device and the water inlet of each substrate processing device are connected via the main pipe. A hydrogen peroxide removal device (2) is provided between the ultraviolet oxidation device of the subsystem and the non-regenerative ion exchange device. The carbon dioxide supply device 4 is provided in the middle of the pipe 3 that branches from the water outlet of the subsystem and reaches the substrate processing apparatus 1. [ The hydrogen peroxide removal device 2 has a pattern of charging a platinum group metal catalyst. With this configuration, the concentration of hydrogen peroxide dissolved in the liquid is suppressed to 2 占 퐂 / liter or less based on the ultrapure water that has passed through the ultraviolet oxidation apparatus, and the specific resistance is adjusted in the range of 0.03 to 5.0 M? 占 ㎝ m by adding carbon dioxide And at least a substrate on which the copper or copper compound is exposed on the surface of the substrate processing apparatus 1 is cleaned by using the carbonic acid water. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190131900-A |
| priorityDate |
2013-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |