http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101818351-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32715 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32642 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate | 2016-06-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2018-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2018-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101818351-B1 |
| titleOfInvention | Plasma processing apparatus having electro conductive parts and method of manufacturing the parts |
| abstract | A plasma processing apparatus having excellent corrosion resistance to plasma, ensuring uniformity of plasma distribution, and including an electrically conductive part having a simple structure, and a method of manufacturing the component are disclosed. The apparatus and method include a component located within a chamber forming a reaction space for plasma processing and in contact with the plasma, wherein the component comprises at least a portion of the plasma-etch resistant metal oxide to a phase change to metal carbide or to a metal oxide Carbon doping, or a combination thereof, and has a resistivity of 10 3 to 10 -6 Ωcm. |
| priorityDate | 2016-06-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 44.