| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F26-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L53-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F297-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F293-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F297-083
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-165
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D153-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F32-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L23-0815
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L23-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L23-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L23-142 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F26-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F32-04 |
| filingDate |
2016-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2017-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2017-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101809569-B1 |
| titleOfInvention |
Compositions and methods for pattern treatment |
| abstract |
The patterning composition comprises a block copolymer and an organic solvent. The block copolymer includes a first block and a second block. The first block comprises units formed from a first monomer comprising an ethylenically unsaturated polymerizable group and a hydrogen acceptor group. The second block comprises units formed from a second monomer comprising an ethylenically unsaturated polymerizable group and a cyclic aliphatic group. Wherein: (i) the second block comprises units formed from a third monomer comprising an ethylenically unsaturated polymerizable group, the second monomer and the third monomer are different and / or (ii) the block copolymer comprises And a third block comprising units formed from a fourth monomer comprising an ethylenically unsaturated polymerizable group, wherein the fourth monomer is different from the first monomer and the second monomer. A pattern processing method using the composition described above is also provided. Patterning compositions and methods have particular applicability in the manufacture of semiconductor devices to provide high resolution patterns. |
| priorityDate |
2015-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |