http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101800735-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B65D47-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B65D51-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B65D81-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-165 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A47J27-088 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate | 2014-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101800735-B1 |
| titleOfInvention | Underlayer composition and method of imaging underlayer |
| abstract | The pattern forming method of the present invention comprises irradiating a portion of a lower layer comprising an acid-sensitive copolymer comprising an acid-decomposable group, an attaching group and a functional group, and a photoacid generator, wherein the attaching unit is provided on the hydrophilic surface of the substrate Covalently bonded to the surface of the substrate and also bridged to form intermolecular crosslinking, and the acid-decomposable group reacts with the acid generated from the photoacid generator of the irradiated portion of the lower layer, Forming a polarity area at the surface of the substrate, the polarity area having the shape and dimensions of the pattern; A self-assembled layer comprising a block copolymer having a first block having affinity for the polarity region and a second block having less affinity than the first block for the polarity region is formed on the surface of the underlayer Wherein the first block forms a first domain aligned with respect to the polarity region and the second block forms a second domain aligned adjacent to the first domain; And removing the first or second domain to expose a lower portion of the lower layer. |
| priorityDate | 2010-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 99.