| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-24 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-653
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F22-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D307-93
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-753
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F24-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-26 |
| filingDate |
2011-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2017-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2017-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101800043-B1 |
| titleOfInvention |
Radiation-sensitive resin composition, method for forming resist pattern, polymer and compound |
| abstract |
The present invention provides a resist film which exhibits excellent water-dropping property on the surface of a resist film due to a high dynamic contact angle during exposure in a liquid-immersion exposure process, and in which the occurrence of development defects is suppressed by greatly reducing the dynamic contact angle during development , And a time required for a change in the dynamic contact angle can be shortened. The present invention relates to a radiation-sensitive resin composition containing [A] a polymer having a structural unit (I) represented by the following formula (1) and a [B] radiation- |
| priorityDate |
2010-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |