| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K59-122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24802 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G65-336
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-032
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G65-007
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-201
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0755
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-223
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-16 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1335
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B33-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2011-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2017-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2017-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101791295-B1 |
| titleOfInvention |
Negative-type photosensitive resin composition, partition wall for use in optical elements and manufacturing method thereof, manufacturing method of an optical element having said partition walls, and ink-repellent agent solution |
| abstract |
It is an object of the present invention to provide a negative-working photosensitive resin composition which is excellent in storage stability of a silanol group and which can be used for manufacturing barrier ribs which can maintain excellent ink-repelling property even after an ink-affinity treatment, and a partition for an optical element using the composition do. (A) comprising a fluorine-containing siloxane compound having a hydroxyl group bonded to a silicon atom and containing fluorine atoms in a proportion of 10 to 55 mass% with respect to the total amount of the compound, A photosensitive resin (B) having an acidic group and an ethylenic double bond in one molecule, A photopolymerization initiator (C) As the negative-working photosensitive resin composition containing the solvent (D) (A) relative to the total solid content of the composition is 0.01 to 10% by mass, and the ratio of the hydroxyl group bonded to the silicon atom derived from the repellent agent (A) to the total amount of the composition is from 0.000001 to 1.0 0.0 > mmol / g. < / RTI > |
| priorityDate |
2010-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |