| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F9-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G69-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02019
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32134
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02329
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G69-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F9-02 |
| filingDate |
2014-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2017-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2017-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101789137-B1 |
| titleOfInvention |
Etching liquid, kit of same, etching method using same, method for producing semiconductor substrate product, and method for manufacturing semiconductor element |
| abstract |
An etching solution containing nitrogen-containing organic compound A or phosphorus-containing compound B having nitric acid, a fluorinated compound, and a plurality of repeating units having a nitrogen atom. |
| priorityDate |
2013-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |