http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101787379-B1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0ba961bfb5c5b958381ba73241ed2ddf |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-053 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-03632 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01J2003-1204 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-05 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01J3-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J9-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03B7-085 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03B7-085 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01J3-12 |
| filingDate | 2016-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e907aab59d593892db48c242ddbc4eff http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d3987aa692845c18c0d4eeb86e9dc57e |
| publicationDate | 2017-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101787379-B1 |
| titleOfInvention | Fabrication Method of Monochromator |
| abstract | The present invention relates to a method of finely finishing an energy selection slit for selecting an electron beam that passes through an electrode portion of a monochromator and is dispersed in accordance with an energy distribution, A finite and precise processing of the slit width for energy selection is performed with a focused ion beam device (FIB), and the processed slit is measured with a scanning electron microscope or a transmission electron microscope. In addition, the in-situ measurement can be performed by using a device in which an FIB and an electron microscope are installed, thereby shortening the moving time between devices, reducing manufacturing costs, increasing the accuracy of slit processing, It is possible to improve the dimensional accuracy of the slit through the inspection of the dimension, the presence of contaminants attached to the slit, the passage of the electron beam other than the slit, and the static electricity of the slit, thereby realizing the aperture portion having the slit with improved spatial resolution and energy resolution, A high performance monochrometer can be manufactured. |
| priorityDate | 2016-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 36.