http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101783513-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-045 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3085 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32139 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31122 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3086 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-04 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate | 2014-09-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101783513-B1 |
| titleOfInvention | Composition for forming a silicon-containing resist under layer film and patterning process |
| abstract | An object of the present invention is to provide a composition for forming a silicon-containing resist underlayer film which has very few coating defects and is capable of forming a resist undercoat film excellent in adhesion and etching selectivity in a fine pattern. The present invention is silicon, which is obtained containing a silicon-containing compound (A 1) by performing both the silicon compound (A-1) to hydrolysis or condensation, or both comprising a compound represented by one to or more kinds of the formula (I) Containing resist underlayer film. Ra, Rb and Rc are each a substituted or unsubstituted monovalent organic group having 1 to 30 carbon atoms, w = 0 or 1, and x = 0, 1, 2 (wherein R is an organic group having 1 to 6 carbon atoms; (X, z) = (1, 2, or 3), y = 0, 1 or 2, and z = 0, X + y + z? 1 when w = 1, and (x, y, z) = ( 1, 1, 1) is not included.) |
| priorityDate | 2013-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 145.