| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L2205-03
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L2205-025 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-16 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate |
2009-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2017-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2017-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101776070-B1 |
| titleOfInvention |
Compositions and processes for photolithography |
| abstract |
To provide a topcoat layer composition applied over the photoresist composition. The compositions have been found to be particularly applicable to immersion lithography processes. |
| priorityDate |
2008-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |