http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101773876-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0279 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 |
| filingDate | 2010-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101773876-B1 |
| titleOfInvention | Organic solvent development or multiple development pattern-forming method using electron beams or euv rays |
| abstract | (1) a step of forming a film with an actinic ray-sensitive or radiation-sensitive resin composition containing an acid-decomposable repeating unit and capable of reducing solubility in an organic solvent by the action of an acid; (2) exposing the film with an electron beam or an EUV line; And (4) a step of developing the film with a developer containing an organic solvent. |
| priorityDate | 2009-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 330.