http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101772612-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0043 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2009-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101772612-B1 |
| titleOfInvention | Photocurable resin mold composition for imprint lithography |
| abstract | The present invention relates to a photocurable resin mold composition for imprint lithography. The photocurable resin mold composition has a non-swelling property with respect to an organic solvent, and is excellent in hardenability, strength and compatibility, It is possible to manufacture a fine pattern necessary for manufacturing various electronic devices including semiconductors, displays and the like more quickly and stably.n n n n Imprint lithography, photocuring, resin, mold composition, strength, chemical resistance, dyspersion |
| priorityDate | 2009-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 145.