http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101771568-B1

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filingDate 2015-11-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2017-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2017-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101771568-B1
titleOfInvention Method of manufacturing thin-film or thick-film of porous metal halides
abstract The present invention relates to a method for manufacturing a porous metal halide thin film or a thick film, and a method for manufacturing the metal halide thin film or the thick film having a porous structure capable of increasing the efficiency of a solar cell. The porous metal halide thin film or the thick film manufacturing method can minimize the residual metal halide after the reaction through the porous metal halide thin film or the thick film. The metal halide in the wet state can be water in the air or spray water from the outside to supply moisture It is possible to control the degree of pore of the metal halide thin film and prevent the remnant metal halide from remaining, which is a very useful technique for synthesizing a high efficiency solar cell.
priorityDate 2015-11-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 34.