http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101766190-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02068 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32715 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32862 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F4-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32135 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213 |
| filingDate | 2014-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101766190-B1 |
| titleOfInvention | Methods of etching films comprising transition metals |
| abstract | Methods are provided for etching films comprising transition metals. Particular methods include activating a substrate surface comprising at least one transition metal wherein activation of the substrate surface comprises exposing the substrate surface to a thermal, plasma, oxidizing environment, or halide transfer agent to provide an activated substrate surface ; Exposing the activated substrate surface to a reagent comprising a Lewis base or pi acid to provide a vapor phase coordination complex comprising one or more atoms of a transition metal coordinated to one or more ligands from the reagent. Certain other methods provide selective etching from a multi-layer substrate comprising at least two of a Co layer, a Cu layer, and a Ni layer. |
| priorityDate | 2013-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 45.