http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101765325-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-3807 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-3842 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C59-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C33-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C59-16 |
| filingDate | 2015-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101765325-B1 |
| titleOfInvention | Method for manufacturing mold using embossed pattern by laser |
| abstract | The present invention relates to a method of manufacturing a mold using a laser positive pattern, and includes a thin film forming step, a positive pattern forming step, and a pattern forming step for a mold. The thin film forming step forms a polymer thin film on a substrate. The embossing pattern forming step irradiates the polymer thin film with a laser beam having an energy density lower than the ablation threshold point at which the polymer thin film is ablated to form a relief pattern expanding from the surface of the polymer thin film. In the pattern formation step for the mold, the polymer thin film is etched to form a pattern for a mold having a size smaller than the relief pattern on the substrate, and the pattern for the mold is formed while the relief pattern is etched. |
| priorityDate | 2015-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 19.