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filingDate 2015-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2017-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2017-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101761001-B1
titleOfInvention Semiconductor device including fin structures and manufacturing method thereof
abstract A method for manufacturing a semiconductor device includes forming a fin structure having a top surface and a side surface. A mask layer is disposed over the top surface. A doping support layer is formed to cover a portion of the fin structure. A first impurity is introduced into the first region of the fin structure covered by the doping support layer by implanting a first impurity into the doping support layer such that the implanted first impurity is introduced into the first region of the fin structure through the side surface.
priorityDate 2015-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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