http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101758391-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-123 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-12 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2012-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2017-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2017-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101758391-B1 |
| titleOfInvention | Resist composition and method of forming resist pattern |
| abstract | (A), a basic compound component (C) and an acid generator component (B) which generates an acid upon exposure by the action of an acid and the acid generator component (B) A resist composition containing a compound represented by the formula (b1) and containing at least one compound represented by the formula (c1) to (c3), wherein the basic compound component (C) is represented by the formula: Z 1 represents a hydrocarbon skeleton- , Q 1 is a divalent linking group containing an O, Y 1 is a fluorinated alkyl group, M + is an organic cation, R 1 is a fluorinated alkyl group or a hydrocarbon group, L 1 +, L 2 + is a sulfonium or iodonium, Z 2 is a hydrocarbon group or a hydrogen atom, Y 2 is a divalent linking group or single bond not containing F, R 2 is an organic group, Y 3 is an alkylene group or an arylene group, and Rf is an F-containing hydrocarbon group. |
| priorityDate | 2011-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 316.